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Glass Wafer Photolithography Materials
Used for the manufacture of reticle, grating ruler, grating horse plate, car mark element and instrument calibration plate;
E-mail: yizhou_li@163.com
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Glass Wafer Photolithography Materials
DESCRIPTION
Name: Micro-nano optical lithography materials:
Use: Used for the manufacture of reticle, grating ruler, grating horse plate, car mark element and instrument calibration plate;
Widely used in microelectronics, optics, optoelectronics, nanodevices, biochips, optical communications and other industries; high-reflection machine vision calibration board, high-contrast machine vision calibration board, robot joint code disc and other micro-nano optical components.
Performance: High precision, good uniformity and small error.
Specifications: Any size less than 1000mm * 1000mm
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