Quartz photomask substrate (Blankmask, also known as "uniform chrome plate", "mask substrate")
IC chip, IGBT chip design graphics to graphics to achieve the mainstream carrier on the substrate material, is the semiconductor lithography manufacturing process to transfer the circuit graphics "negative" of high-precision materials.
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category:
Semiconductor quartz photomask material
DESCRIPTION
Use:IC chip, IGBT chip design graphics to graphics to achieve the mainstream carrier on the substrate material, is the semiconductor lithography manufacturing process to transfer the circuit graphics "negative" of high-precision materials.
Features:
♦High sensitivity, high resolution, low defect density, wear resistance etching uniformity, good repeatability;
Specifications:5 ″ (q5009) 、 6 ″ (q6025) 、 7 ″ (q7012/7015/)、 9 ″ (q9012);
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