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Changsha Shaoguang Core Material Technology Co., Ltd.

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Congratulations to Changsha Shaoguang Core Material Co., Ltd. for successfully passing the intellectual property standard!!

Release time:

2019-04-02

Source:

Through the joint efforts and cooperation of all colleagues of the company, Changsha Shaoguang Core Material Co., Ltd. passed the intellectual property management system certification in December 2018, and obtained the intellectual property management system certification issued by Zhongzhi Certification.

Congratulations on our selection as the first new Hunan contribution award advanced collective

The release of national standards!!!

Congratulations on our selection as the first new Hunan contribution award advanced collective

The release of national standards!!!

Latest News

The company won the fourth batch of special funds for the construction of advanced manufacturing highlands in Hunan Province in 2023

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Fu Xuming: Strive to create a new situation in the listing of county enterprises!

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The list of the fourth batch of Hunan manufacturing single champion products was announced. 58 products of Changsha enterprises were on the list.

Changsha Evening News, Changsha, June 5 (all-media reporter Li Guangjun) The reporter learned on the 5th that the Provincial Department of Industry and Information Technology recently organized the fourth batch of Hunan Province's manufacturing industry single champion product selection work. The list of the fourth batch of Hunan Province's manufacturing industry single champion products is currently being announced, with a total of 198 products on the list, among them, 58 products are made in Changsha.

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Application of photomask substrate in electronic field

Photomask substrate is an important mold making material in semiconductor microelectronics manufacturing. It is a transparent or translucent material that can withstand high-resolution optical projection. Photomask substrates are widely used in the manufacturing process of semiconductor chips, flat panel displays, optical fiber communication devices, etc. The material properties of the photomask substrate determine whether it can withstand high-resolution optical projection. Typical photomask substrate materials are glass, quartz, polymer, etc. For example, photoresist is a commonly used photomask substrate material. It has high optical transparency, chemical stability and mechanical strength, and is suitable for high-precision micro-processing. Production usually includes film graphics production, photoresist coating, exposure and development steps. Photolithography exposure light source is the key to the production of photoresist, the use of light source irradiation on the photomask, the formation of pre-selected patterns on the photomask, through the mask light transmission imaging, and projected onto the photoresist layer, to produce a tiny semiconductor device structure. The specific steps are cumbersome, and the conditions and parameters of different links need to be strictly controlled. The photomask substrate is crucial in the manufacturing process of the semiconductor chip. It is mainly used in the parts related to the lithography process, including chip circuit design, mask production, optical equipment production, photoresist preparation, etc. in the semiconductor core

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The Importance of Photomask Substrate in Semiconductor Production

Mask technology plays a vital role in the field of semiconductor production. It can be used to make chips, shining light or electron beams into a photomask and projecting them onto a silicon wafer through a translucent film on the surface of the chip. A photomask blank is a special type of substrate that contains a precise lithographic pattern for the production of chips. Photomask substrates are widely used in wafer fabrication processes because they provide highly accurate lithographic patterns for chip fabrication. This substrate is made of high-quality quartz material, and its surface flatness and flatness are very accurate, which can provide highly consistent and accurate scoring results. High-quality substrates can not only improve manufacturing efficiency and productivity, but also ensure the quality and reliability of the chip. In semiconductor production, in order to ensure good manufacturing results, it is necessary to use a high-quality photomask substrate. Each substrate needs to undergo strict quality control to ensure that it meets the needs of the manufacturing process. These substrates are also specially treated to ensure that their surface is smooth and flawless, making it easier to perform photolithography. In addition, the substrates are also tested for performance to ensure that they can provide high-quality services during the manufacturing process. The photomask substrate is an indispensable part of the semiconductor production process. High quality base

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Application of photomask substrate in integrated circuit manufacturing

A photomask blank is a manufacturing method commonly used in a semiconductor process, and a desired pattern and structure are formed by using a mask on a silicon wafer and a light irradiation technique. Its manufacturing process is simple, can efficiently produce a large number of tiny chips, so it is widely used in semiconductors, optoelectronics, biomedical, and micro-mechanical systems and other fields. The main features of the photomask substrate are high manufacturing precision, good repeatability, reusable, and relatively stable physical and chemical properties, which can meet the structural and performance requirements of different industries. At the same time, it is also an important basis for microelectronics and optoelectronic devices. With the continuous development of modern science and technology, photomask substrate has become a representative of high-tech fields, and is widely used in various fields, such as semiconductor manufacturing, micro-mechanical systems, biomedical, etc., and its application is becoming more and more extensive. Although the manufacture and application of photomask substrates are quite mature, there are a large number of brands and manufacturers competing in the market. However, with the acceleration of scientific and technological progress, the demand for high-precision manufacturing is also increasing, how to innovate and upgrade the photomask substrate has become a problem that manufacturers need to think about. This is also a problem that we need to constantly explore and try, only through

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Hyperplane optical element, scientific development of hyperplane optical element

If you are a technology enthusiast, then you must have heard of hyperplanar optics, which is a new type of optical element that can adjust the direction of light and greatly improve the utilization of light. The secret of the hyperplane optical element is that it can not only adjust the direction of light, but also change the wavelength of light, separate a beam of light into multiple beams of light, so that the light propagates in multiple directions, thereby effectively changing the propagation of light The way, so that the light has stronger energy and signal transmission capabilities. Hyperplane optics are optical elements with special functions and properties that control and adjust the transmission, reflection and refraction of light. They are based on micro-nano technology and optical technology, built on the surface of the element, they have a very wide range of applications, can play an important role in the laser, information transmission, biological detection and other fields. Hyperplane optical elements have important applications in optical microscopy. They can be used to adjust and align the light, thereby improving the imaging quality of the microscope and reducing image distortion. In addition, hyperplane optics can also improve the spatial resolution of the microscope, so as to better identify small objects such as cells. 2. Laser technology hyperplane optical elements have also been

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