Quartz photomask substrate (Blankmask, also known as "uniform chrome plate", "mask substrate")

IC chip, IGBT chip design graphics to graphics to achieve the mainstream carrier on the substrate material, is the semiconductor lithography manufacturing process to transfer the circuit graphics "negative" of high-precision materials.

Soda photomask substrate (Blankmask, also known as "uniform glue chrome plate", "mask substrate")

It is the mainstream carrier for pan-semiconductor micro-graphics and micro-nano processing from design to graphics implementation, and is the main material for discrete devices, LED chips, light-emitting diode photomasks and optical masters;

Photomask substrate for flat panel display

It is the mainstream processing carrier for FPD, PCB, MEMS, LCD, TP touch, TFT and other flat panel display devices from graphic design to graphic realization, it is a thin film transistor liquid crystal display (TFT-LCD) mask, including array (Array) mask (a-Si/LTPS technology), color filter (CF) mask, active matrix organic light emitting diode display (AMOLED) mask, mainly Array mask (AMOLED technology), super twisted nematic liquid crystal display (STN-LCD) mask, FineMetalMask mask main substrate.

Micro nano optical lithography materials

Used for the manufacture of reticle, grating ruler, grating horse plate, car mark element and instrument calibration plate;